FACILITIES

Multifunctional UHV system (LHS): XPS, UPS, ISS, TPD, Kelvin Probe, PEEM, LEED, sample handling tools, and load-lock chamber
Multifunctional UHV system (Max 200): XPS, electron irradiation, sample handling
Endstation for XPS/NEXAFS at the HESGM beamline (BESSY II, Berlin), maintained by a community (CRG) of several groups
Molecular junction setup for the measurements of conductive properties of molecular films and SURMOFs
LEO 1530 Secondary electron microscope (Zeiss) with a Raith Elphy Plus pattern generator system - shared with other groups at the Physical-Chemical Institute.
Mask-free lithographic setup, based on commercial components and including a high power UV LED (375 nm) as the light source, a digital micro-mirror device (DMD) chip, and projection optics. This equipment is shared with a partner group
AFM device Solver Next (NT-MDT) – shared with a partner group;
Vertex 70 Fourier transform IR spectrometer (Bruker) – shared with a partner group;
M-44 ellipsometer (J.A. Woollam Co. Inc.) - shared with a partner group;
UV-Vis spectrophotometer Jasco V-650 (transmission and reflection units)
Electrochemistry setup
Krüss goniometer Model G1 - shared with a partner group;
Chemistry lab

Surface Science & Analytics - Prof. (apl.) Dr. Michael Zharnikov